Filtration Division

Our Filtration Division is committed to providing cutting-edge filtration solutions for the semiconductor industry, covering a wide range of industries including wet chemistry, photoresist, CMP, aqueous and gaseous solutions. Designed to ensure maximum purity and reliability in critical manufacturing processes, our filters enable our customers to achieve optimal performance and maximize product yield.

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PRECISION FILTRATION

FOR CONSTANT EXCELLENCE

STANDARDS OF

HIGH FILTRATION

Our products set high filtration standards, ensuring a high-quality filtrate and effective removal of particles, contaminants and impurities from liquids and gases.

CUSTOMIZATION

ON REQUEST

We offer customized filtration solutions to meet the specific needs of each industrial sector, ensuring optimal effectiveness and long product life.

CUTTING-EDGE TECHNOLOGY

Thanks to our cutting-edge technologies and rigorous quality controls, we provide tested products that ensure optimal cleaning of the liquid/gas, guaranteeing reliability and consistent performance over time.

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Explore our product categories to get a general idea of the solutions we offer. However, we are continually updating and expanding our product range, so not all products may be listed here.

For detailed information on specific products or for special requests, please contact us directly. Our team will be happy to assist you and provide you with the information you need for your pneumatic needs.

DISCOVER OUR FILTRATION DIVISION

WET CHEMICAL

Chemvast Cost Effective all-fluoropolymer

Chemvast ™ , a complete and cost-effective fluoropolymer

Chemvast ™ has a PVDF structure with a PTFE membrane making it suitable for filtering electronic grade chemicals. Economical solution for HF filtration. Available as a hydrophilic PTFE membrane.

Chemvast ™, constructed as a hydrophilic PTFE membrane, requires no pre-wetting and is ready to use to filter polar liquids. Full fluoropolymer construction that ensures excellent chemical compatibility and temperature resistance. Particularly suitable for filtering HF acid - Each element is individually tested to ensure integrity.

Chemphobic ultra pure chemical filter

The all-fluorine construction makes it suitable for filtration of highly corrosive chemicals at high temperatures, including SPM/H3P04/PAH.

Available with removal values from 7nm-50nm to meet all ultrapure chemical filtration requirements.

Cleaning the filter reduces equipment pre-operation time.

The one-piece structural design facilitates installation and replacement of the filter capsule. Ultra-low metal extractability.

Novacon Ultra High Precision Chemical Filter

Very high precision Novacon chemical filter

High retention efficiency, flow rates and surface area enable fast operation. The high-density membrane structure ensures enhanced 2nm retention. The hydrophilic membrane makes it suitable for the filtration of DHF/ BOE/ DIW/ SC1/ SC2 <60°C.

The highly asymmetric structure of the HAPES membrane ensures higher flow rates and longer life.

Filter cleaning reduces equipment pre-operation time, while metal extractability is extremely low thanks to the fluorine structure and one-piece design, which simplifies installation and replacement of the filter capsule.

Chemega ™ high efficiency filtration for chemicals

Chemega ™ consists of a PTFE membrane that offers excellent chemical commerce and is inherently hydrophobic. It has been specifically designed to limit iron extraction, to meet the chemical and organic solvent requirements of the electronics industry.

The Chemega™ filter cartridge series consists of a ready-to-use hydrophilic PTFE membrane to filter polar solvents without the need for pre-wetting.

Chemrapid Surface-modifield Ultrapure Chemicals Filter

Chemrapid filter for ultrapure surface-modified chemicals

Modified non-wetting membrane improves surface energy. Superior filtration efficiency and high filtration rate. Available in removal grades from 7nm-50nm to meet all ultrapure chemical filtration requirements. Filter cleaning reduces equipment pre-operation time. All-fluorine construction makes it suitable for filtration of highly corrosive high-temperature chemicals, including SPM/H3P04/IPA.

One-piece structural design facilitates installation and replacement of the filter capsule. Very low metal extractability.

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PHOTORESIST

Photopex UPE

PhotopexTM UPE filter cartridges, with retention values from 1 nm to 5 nm, offer excellent retention capabilities, cleanliness and high chemical compatibility for critical semiconductor process requirements. With its superior cleanliness, the high-purity PE structure ensures low particle dispersion and contaminant removal, improving removal efficiency. In addition, the large surface area of the filter allows for high flow rates and longer service life. Available in various sizes and configurations to meet every need. Contact us for more information.

APPLICATIONS: Photoresist filtration - Solvent filtration - Photochemical filtration - Wet cleaning

FEATURES AND BENEFITS: Higher efficiency, greater chemical compatibility, improved initial cleaning, very low metal and organic extractables content.

Photopex Multi

According to different application needs, we use our know-how and experience to customize the product. Double-layer membrane structure to ensure higher filtration efficiency for more sophisticated semiconductor processes.

Use of high-purity PE structure and application of ultra-clean technology to ensure filter cleanliness.

APPLICATIONS: Filtration of photoresist - Filtration of solvents - Photochemical filtration.

FEATURES AND BENEFITS: higher efficiency, naturally hydrophilic, better initial cleaning, 100% integrity tested.

PHOTOPEX Nylon Ultra-Hih Efficiency Filter

Ultra-high efficiency Photopex™ Nylon filter

Photopex™ nylon filter cartridges offer high flow rate, excellent retention capacity and cleanliness, ideal for filtering photoresist, solvents and other chemicals in semiconductor processes. Using a pure unmodified hydrophilic nylon membrane, these cartridges provide reliable levels of metal extractability and particle cleanliness. Filter cleaning reduces equipment setup time.

Available in different sizes and configurations to meet every need. For more information, please feel free to contact us.

APPLICATIONS: Photoresist filtration - Solvent filtration - Photochemical filtration.

FEATURES AND BENEFITS: higher efficiency, naturally hydrophilic, better initial cleaning, 100% integrity tested

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CMP

Keevalid™

It removes defective particles while allowing effective ones to pass through.

Mud polishing filter
of depth 05 nm-11nm

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WATER SOLUTION

DI Hydropure Water Purifier

Effectively removes metal ions from ultra-pure water

Ensures stable production of ultra pure water

Low-flow conductivity recovery time

Apesfend™ electronic-grade DI water fine filtration filter

Apesfend™ is a highly asymmetric PES membrane. Widely used for DI and ultra-pure water filtration, its features include low ion release, good conductivity recovery, reduced in-line flushing time, and high retention efficiency. These features ensure ultra pure water quality at the outlet.

High retention efficiency (down to 0.03 nm)
Long service life
Low content of extractables
Washing with DI 18 M𝛀 water.

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GAS SOLUTION

Gasfender Ultra-pre gas cartridge filter

Gasfender™ is constructed of electronic-grade stainless steel. It is specially designed for in-line gas filtration in the semiconductor process at high temperatures and pressures.

High flow rates and low pressure drop
Fine filtration accurate to 0.003 um
Electronic-grade stainless steel construction includes internal electropolishing
Available in a wide range of sizes to meet all customer needs
Excellent chemical compatibility
100% leak test with helium

Gasclar™ chemical filter

Gasclar™ filter cartridges remove chemical compositions from gases. They are designed specifically for display machines, LAB factories, and as air filtration solutions for clean rooms.

Gasclar™ FM filter cartridges consist of a foam backing with activated carbon and nonwoven backing. The design ensures no particle leakage during the downstream process. They can be used to remove acids (including acetic acid and HCI), bases (NH3) and VOCs (PGMEA and halocarbons).

Minimal pressure loss
High odor/OC adsorption capacity (with optional carbon filters)
No loss of particles
Low energy consumption
Minimal weight

Gasclar™ SCS filter cartridges use self-ligating technology. This reduces the possibility of clogging by activated carbon or release of contaminant particles, as no adhesives are used in the construction of the filter cartridge. This filter effectively reduces pressure drop and has a high adsorption capacity.

High adsorption efficiency
High adsorption capacity
Minimal pressure drop

Gasclar™ IC filter cartridges are composed of carbon media with non-woven fabric backing. Even at low concentrations, this filter ensures high retention of targeted objects.